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Electrical and Optical Characterization of Thin Film

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dc.contributor.author Rahman, Afshania
dc.date.accessioned 2014-12-22T03:21:30Z
dc.date.available 2014-12-22T03:21:30Z
dc.date.issued 8/12/2014
dc.identifier.uri http://dspace.ewubd.edu/handle/2525/1054
dc.description This thesis submitted in partial fulfillment of the requirements for the degree of Masters of Science in Applied Physics and Electronics of East West University, Dhaka, Bangladesh en_US
dc.description.abstract In this work, thin film of Al and Zno has been developed on microscopic glass substrate using EDWARD thermal vacuum evaporator. The thickness of the deposit films was measured using surface stylus profilometer Dektak-150. The deposition of the films was found in between 600 and 650 um. Over a total scan length 1000rm. The obtained thickness could be assessed precise for the present research and the uniform deposition within the obtained thickness may be attributed to strong adhesion between the materials of film and the microscopic glass substrate. Resistivity of the deposition thin films was measured by four point probe collinear technique using 4200 model semiconductor characterization system (SCS). The morphology of thin films was studied using scanning Electron Microscope. Absorption was assessed by UV-VIS spectrometer SEM. en_US
dc.language.iso en_US en_US
dc.publisher East West University en_US
dc.relation.ispartofseries ;ECE00018
dc.subject Optical Characterization of Thin Film en_US
dc.title Electrical and Optical Characterization of Thin Film en_US
dc.type Thesis en_US


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