Electrical and Optical Characterization of Thin Film

Abstract

In this work, thin film of Al and Zno has been developed on microscopic glass substrate using EDWARD thermal vacuum evaporator. The thickness of the deposit films was measured using surface stylus profilometer Dektak-150. The deposition of the films was found in between 600 and 650 um. Over a total scan length 1000rm. The obtained thickness could be assessed precise for the present research and the uniform deposition within the obtained thickness may be attributed to strong adhesion between the materials of film and the microscopic glass substrate. Resistivity of the deposition thin films was measured by four point probe collinear technique using 4200 model semiconductor characterization system (SCS). The morphology of thin films was studied using scanning Electron Microscope. Absorption was assessed by UV-VIS spectrometer SEM.